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Applied Physics A: Materials Science and Processing

Volumn 72, Issue 5, 2001, Pages 595-601

Development of conductive transparent indium tin oxide (ITO) thin films deposited by direct current (DC) magnetron sputtering for photon-STM applications

(4) Deng, W a Ohgi, T a Nejo, H a Fujita, D a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; PHOTONS; SCANNING TUNNELING MICROSCOPY; SPUTTER DEPOSITION; THERMAL EFFECTS; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS;

CONDUCTIVE THIN FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; FILM PROPERTIES; FILM TREATMENT; FILM UNIFORMITY; INDIUM TIN OXIDE;

INDIUM COMPOUNDS;

EID: 0034967365 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100740 Document Type: Article

Times cited : (40)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.