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Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 595-600

Vacuum-ultraviolet pulsed-laser deposition of silicon dioxide thin films

(2) Jackson, Brian D a Herman, Peter R a,b

a UNIVERSITY OF TORONTO (Canada)

b NONE (Canada)

Author keywords

Fluorine laser; Laser ablation; Pulsed laser deposition; Silicon dioxide; Thin film; Vacuum ultraviolet

Indexed keywords

ARGON; DEPOSITION; DOPING (ADDITIVES); FILM GROWTH; GAS LASERS; LASER ABLATION; OPTICAL WAVEGUIDES; PULSED LASER APPLICATIONS; STOICHIOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ASYMMETRIC STRETCHING MODE (ASM); FULL WIDTH AT HALF MAXIMUM; PULSED LASER ABLATION; VACUUM ULTRAVIOLET PULSED LASER DEPOSITION;

SILICA;

EID: 0032074440 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00712-5 Document Type: Article

Times cited : (16)

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