Fabrication of hydrophobic fluorinated amorphous carbon thin films by an electrochemical route

Electrochemistry Communications

Volumn 10, Issue 1, 2008, Pages 7-11

  Chen, Gang ^a,b   Zhang, Junyan ^a   Yang, Shengrong ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

AFM; Electrochemical deposition; Fluorinated amorphous carbon; FTIR; Hydrophobic effect

Indexed keywords

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ELECTRODEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHOBICITY; MICROSTRUCTURE; SINGLE CRYSTALS;

ELECTROCHEMICAL DEPOSITIONS; FLUORINATED AMORPHOUS CARBON; HYDROPHOBIC EFFECTS; LIQUID PHASE ELECTRODEPOSITIONS; NANOSTRUCTURED SURFACES;

THIN FILMS;

EID: 37349020301     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2007.10.006     Document Type: Article

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