Fluorinated amorphous diamond-like carbon films deposited by plasma-enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 191, Issue 2-3, 2005, Pages 236-241

  Yu, G Q ^a   Tay, B K ^a   Sun, Z ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Fluorinated amorphous diamond like carbon films; Plasma enhanced chemical vapor deposition; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; ETCHING; FILM PREPARATION; FLUORINE; METHANE; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING CONFIGURATIONS; FILM SURFACE ENERGY; GAS PRECURSORS;

DIAMOND LIKE CARBON FILMS;

DIAMOND-LIKE CARBON;

EID: 10944220938     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.060     Document Type: Article

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