Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography

Japanese Journal of Applied Physics

Volumn 31, Issue 9 R, 1992, Pages 2954-2958

  Deguchi, Kimiyoshi ^a   Miyoshi, Kazunori ^a   Ishii, Tetsuyoshi ^a   Matsuda, Tadahito ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Chemically amplified resist; Critical dimension control; Exposure latitude; Post exposure baking; Resolution; Sr lithography; X ray lithography

Indexed keywords

AMPLIFICATION; DIMENSIONAL STABILITY; FABRICATION; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; PATTERN RECOGNITION; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

ASPECT RATIO; CHEMICAL AMPLIFICATION; CRITICAL DIMENSION CONTROL; NEGATIVE RESIST SAL601-ER7; PATTERNING CHARACTERISTICS; POST EXPOSURE BAKING; RESOLUTION LIMITING FACTORS; SENSITIVITY; SUBQUARTERMICRON DEVICE FABRICATION; SWAYING BEAM MODEL;

PROTECTIVE COATINGS;

EID: 0026928382     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.31.2954     Document Type: Article

References (16)

1. H. Ito and C. G. Willson 1983 Polm. Eng. Sci.23 1012.
2. H. Liu, M. deGrand pre and W. E. Feely 1988 J. Vac. Sci. & Technol.B6 379.
3. J. Lingnau, R. Dammel and J. Theis 1989 Polym. Eng. Sci.29 874.
4. H. Ban, J. Nakamura, K. Deguchi and A. Tanaka 1991 J. Vac. Sci. & Technol.B9 3387.
5. J. Nakamura, H. Ban, K. Deguchi and A. Tanaka 1991 Jpn. J. Appl. Phys.30 2619.
6. L. Schlegel, T. Ueno, N. Hayashi and T. Iwayanagi 1991 J. Vac. Sci. & Technol.B9 278.
7. J. Grimm, J. Chlebek, T. Schulz and H. L. Huber 1991 J. Vac. Sci. & Technol.B9 3392.
8. T. H. Fedynyshyn, M. C. Cronin and C. R. Szmand a 1991 J. Vac. Sci. & Technol.B9 3380.
9. T. Hosokawa, T. Kitayama, T. Hayasaka, S. Ido, Y. Uno, A. Shibayama, J. Nakata, K. Nishimura and M. Nakajima 1989 Rev. Sci. Instrum.60 1783.
10. T. Kaneko, Y. Saitoh, S. Itabashi and H. Yoshihara 1991 J. Vac. Sci. & Technol.B9 3214.
11. S. Ishihara, M. Kanai, A. Une and M. Suzuki 1991 J. Vac. Sci. & Technol.B9 1652.
12. C. Watamori 1977 Kikaikougakubinran (Mechanical Engineering Hand book) (Japan Society of Mechanical Engineers, Japan) 6th ed., p. 4-51 [in Japanese].
13. M. Ibonai 1988 Engineering Plastic Hand book (Gihoudo-shuppan, Japan) p. 555 [in Japanese].
14. Y. Somemura and K. Deguchi 1992 Jpn. J. Appl. Phys.31 938.
15. K. Deguchi, T. Ishiyama, T. Horiuchi and A. Yoshikawa 1990 Jpn. J. Appl. Phys.29 2207.
16. A. Yoshikawa, T. Horiuchi, K. Deguchi, M. Miyake, E. Yamamoto, Y. Sakakibara and T. Kitayama 1990 Microelectron. Eng.11 233.