Ultra temperature-stable bulk-acoustic-wave resonators with SiO 2 compensation layer

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 54, Issue 10, 2007, Pages 2102-2109

  Yu, Hongyu ^a,b   Pang, Wei ^a,c   Zhang, Hao ^d   Kim, Eun Sok ^a,b  

^a IEEE

^b University of Southern California ^*  (United States)

^c BROADCOM CORPORATION   (United States)

^d SKYWORKS SOLUTIONS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPENSATION LAYER; HIGH-OVERTONE ACOUSTIC RESONATOR (HBAR); TEMPERATURE COEFFICIENT; VAPOR ETCHING;

ACOUSTIC RESONATORS; CANTILEVER BEAMS; PHYSICAL PROPERTIES; SILICA; SURFACE MICROMACHINING;

ACOUSTIC BULK WAVE DEVICES;

EID: 37149003145     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2007.505     Document Type: Article

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