Film bulk acoustic resonator at 4.4 GHz with ultra low temperature coefficient of resonant frequency

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 28-31

  Yu, Hongyu ^a   Pang, Wei ^a   Zhang, Hao ^a   Kim, Eun Sok ^a  

^a University of Southern California ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC DEVICES; COMPUTER SIMULATION; CRYOGENICS; ETCHING; MICROMACHINING; NATURAL FREQUENCIES; RESIDUAL STRESSES; THERMAL EFFECTS; VAPORS;

FILM BULK ACOUSTIC RESONATORS (FBAR); MICROMACHINED CANTILEVER; TEMPERATURE PARAMETER; VAPOR ETCHING;

RESONATORS;

EID: 20544476268     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. T. W. Grudkowski, J. F. Black, T. M. Reeder, D. E. Cullen, and R. A. Wagner, "Fundamental-mode VHF/UHF minature acoustic resonators and filters on silicon," Appl. Phys. Lett., vol. 37, pp. 993-995, 1980.
2. K.M. Lakin and J.S. Wang, "Acoustic Wave bulk composite resonators," Appl. Phys. Lett., vol. 38, pp. 125-127, 1981.
3. 2 diaphragm composite resonator on a silicon wafer," Electron. Lett., vol. 17, pp. 507-509, 1981.
4. R. Ruby and P. Merchant, "Micromachined Thin Film Bulk Acoustic Resonators," IEEE International Frequency Control Symposium, 1994, pp. 135-139
5. S.V. Krishnaswamy, J. Rosenbaum, S. Horwitz, C. Vale, R.A.Moore, "Film bulk acoustic wave resonator technology," proc. Ultrasonics Symposium, 1990. 4-7 Dec. 1990 pp:529-536