Control of temperature coefficient of frequency in zinc oxide thin film bulk acoustic wave resonators at various frequency ranges

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 467-472

  Yoshino, Y ^a   Takeuchi, M ^a   Inoue, K ^a   Makino, T ^a   Arai, S ^a   Hata, T ^b  

^a MURATA MANUFACTURING CO LTD   (Japan)

^b KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC BULK WAVE DEVICES; ACOUSTIC RESONATORS; ANNEALING; OPTIMIZATION; PIEZOELECTRIC MATERIALS; SUBSTRATES; THERMAL EFFECTS; THICKNESS CONTROL; ZINC OXIDE;

THIN FILM ACOUSTIC WAVE RESONATORS;

THIN FILMS;

EID: 0037136191     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00117-3     Document Type: Article

References (10)

1. VCO resonators using ZnO sputtered film
2. Optimization of ZnO piezoelectric thin films and bottom electrodes in thin film bulk acoustic wave resonator
3. ISPC-8
4. 1998 Spring meeting proceedings
5. 1996 Fall meeting proceedings
6. Effects of interface microstructure in crystallization of ZnO thin films prepared by radio frequency sputtering
7. Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates
8. 1999 Fall meeting proceedings