Electron drift velocity in NH3 in strong electric fields determined from rf breakdown curves

Journal of Physics D: Applied Physics

Volumn 38, Issue 6, 2005, Pages 872-876

  Lisovskiy, V ^a,c   Martins, S ^b   Landry, K ^b   Douai, D ^b   Booth, J P ^a   Cassagne, V ^b  

^a ECOLE POLYTECHNIQUE   (France)

^b SAS   (France)

^c V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD EFFECTS; ELECTRON MOBILITY; ELECTRON TRANSPORT PROPERTIES; FREQUENCIES; IONIZATION;

BREAKDOWN CURVES; ELECTRON DRIFT VELOCITY; LOW PRESSURE AMMONIA; RADIO-FREQUENCY;

AMMONIA;

EID: 15744364675     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/6/015     Document Type: Article

References (30)

1. Bellakhal N 2002 Mater. Res. Bull. 37 2539
2. Dimitrova T, Atanassova E, Beshkov G and Pazov J 1994 Thin Solid Films 252 89
3. Shul R J and Pearton S J 2000 Handbook of Advanced Plasma Processing Techniques (Berlin: Springer)
4. Alexandrov L N, Belousov I I and Efimov V M 1988 Thin Solid Films 157 337
5. Gupta M, Rathi V K, Singh S P and Agnihotri O P 1988 Thin Solid Films 164 309
6. Gonzalvez J M, Luna R G, Tudanca M, Sanchez O, Albella J M and Martinez-Duart J M 1992 Thin Solid Films 220 311
7. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
8. Takechi K, Takagi T and Kaneko S 1998 Japan. J. Appl. Phys. 37 1996
9. Orfert M and Richter K 1999 Surf. Coat. Technol. 116-119 622
10. Ohta H, Nagashima A, Hori M and Goto T 2001 J. Appl. Phys. 89 5083
11. Gleskova H, Wagner S, Gasparik V and Kovac P 2001 Appl. Surf. Sci. 175-176 12
12. Schultz A, Baumgartner K-M, Feichtinger J, Walker M, Schumacher U, Eike A, Herz K and Kessler F 2001 Surf. Coat. Technol. 142-144771
13. Sansonnens L, Bondkowski J, Mousel S, Schmitt J P M and Cassagne V 2003 Thin Solid Films 427 21
14. Schultz A, Feichtinger J, Kruger J, Walker M and Schumacher U 2003 Surf. Coat. Technol. 174-175 947
15. Kim B, Kim D W and Han S S 2004 Vacuum 72 385
16. Morosanu C E 1982 Thin Solid Films 91 251
17. Ron Y, Raveh A, Carmi U, Inspektor A and Avni R 1983 Thin Solid Films 107 181
18. Nielsen R A and Bradbury N E 1937 Phys. Rev. 51 69
19. Pack J L, Voshall R E and Phelps A V 1962 Phys. Rev. 127 2084
20. Christophorou L G, Datskos P G and Carter J G 1991 Nucl. Instrum. Meth. Phys. Res. A 309 160
21. Christophorou L G, Carter J G and Maxey D V 1982 J. Chem. Phys. 76 2653
22. Christophorou L G and Carter J G 1968 Chem. Phys. Lett. 2 607
23. Lisovskiy V A and Yegorenkov V D 1997 Record-Abstracts of IEEE Int. Conf. on Plasma Science (San Diego, USA) p 137
24. Lisovskiy V A 1998 Tech. Phys. Lett. 24 308
25. Lisovskiy V A and Yegorenkov V D 1998 J. Phys. D: Appl. Phys. 31 3349
26. Lisovskiy V A and Yegorenkov V D 1999 J. Phys. D: Appl. Phys. 32 2645
27. Hayashi M 1990 in Nonequilibrium Processes in Partially Ionized Gases ed M Capitelli and J N Bardsley (New York: Plenum) p 333
28. Levitskii S M 1957 Sov. Phys-Tech. Phys. 2 887
29. Mark T D 1985 Electron Impact Ionization ed T D Mark and G H Dunn (Wien: Springer) p 137
30. Rao M V V S and Srivastava S K 1992 J. Phys. B: At. Mol. Opt. Phys. 25 2175