Vectorial effects in subwavelength mask imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Cheng, Wen Hao ^a   Farnsworth, Jeff ^a   Bloomstein, Theodore M ^b   Grenville, Andrew ^a,c  

^a INTEL CORPORATION   (United States)

^b MIT LINCOLN LABORATORY   (United States)

^c SEMATECH   (United States)

Author keywords

ArF immersion lithography; Diffraction; Mask; Off axis illumination; Pellicle transmission; Polarization; Resonance; Topography

Indexed keywords

ARF IMMERSION LITHOGRAPHY; OFF AXIS ILLUMINATION; PELLICLE TRANSMISSION; TOPOGRAPHY;

APPROXIMATION THEORY; ILLUMINATING ENGINEERING; IMAGING SYSTEMS; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY;

MASKS;

EID: 33644588308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632372     Document Type: Conference Paper

References (3)

1. M. H. Bennett, A. Grenville, S. D. Hector, S. R. Palmer, L. H. A. Leunissen, V. Philipsen, T. M. Bloomstein, D. E. Hardy, M. Rothschild, and J. N. Hilfiker, "Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations," Proc. SPIE v. 5754, 599, 2004.
2. th ed., 1999.
3. W.H. Cheng et al, "Alternating phase shift mask architecture scalability, implementations and applications for 90nm & 65nm technology nodes and beyond", Proceedings of SPIE, Photo Mask Japan, Vol. 5130, 48, 2003.