Direct patterning, conformal coating, and erbium doping of luminescent nc-Si/SiO2 thin films from solution processable hydrogen silsesquioxane

Advanced Materials

Volumn 19, Issue 21, 2007, Pages 3513-3516

  Hessel, Colin M ^a   Summers, Mark A ^a   Meldrum, Al ^a   Malac, Marek ^a,b   Veinot, Jonathan G C ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ERBIUM COMPOUNDS; LUMINESCENCE; SILICON COMPOUNDS; SPIN COATING; TRANSMISSION ELECTRON MICROSCOPY;

CONFORMAL COATING; DIRECT PATTERNING; ERBIUM DOPING; SOLUTION PROCESSABLE HYDROGEN SILSESQUIOXANE;

THIN FILMS;

EID: 36249004356     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200700731     Document Type: Article

References (23)

1. J. M. Buriak, Chem. Rev. 2002, 102, 1271.
2. J. G. C. Veinot, Chem. Commun. 2006, 40, 4160.
3. A. Meldrum, Recent Res. Devel. Nuclear Phys. 2004, 1, 93.
4. D. J. Lockwood, L. Pavesi, Top. Appl. Phys. 2004, 94, 1.
5. a) R. J. Walters, G. I. Bourianoff, H. A. Atwater, Nat. Mater. 2005, 4, 143.
6. b) J. Valenta, N. Lalic, X Linnros, Appl. Phys. Lett. 2004, 84, 1459.
7. c) M. A. Green, J. H. Zhao, Wang, P. J. Reece, M. Gal, Nature 2001, 412, 805.
8. d) N. Lalic, J. Linnros, J. Lumin. 1998, 80, 263.
9. L. Pavesi, Proc. SPIE-Int. Soc. Opt. Eng. 2003, 4997, 206.
10. C. M. Compagnoni, R. Gusmeroli, D. Ielmini, A. S. Spinelli, A. L. Lacaita, J. Nanosci. Nanotechnol. 2007, 7, 193.
11. a) A. Hryciw, C. Blois, A. Meldrum, T. Clement, R. DeCorby, Q. Li, Opt. Mater. 2006, 25, 873.
12. b) Y. H. Ha, S. Kim, D. W. Moon, J.-H. Jhe, J. H. Shin, Appl. Phys. Lett. 2001, 79, 287.
13. c) M. Schmidt, J. Heitmann, R. Scholz, M. Zacharias, J. Non-Cryst. Solids 2002, 299 302, 678.
14. d) J. S. Ha, G. Y. Sung, S. Lee, Y. R. Jang, K. H. Yoo, C. H. Bae, J. S. Jeon, S. H. Nam, S. M. Park, Appl. Phys. A 2004, 79, 1485.
15. T. J. Clement, R. G. DeCorby, N. Ponnampalam, T. W. Allen, A. Hryciw, A. Meldrum, Opt. Express 2006, 14, 12151.
16. V. Svrcek, A. Slaoui, J.-C. Muller, J. Appl. Phys. 2004, 95, 3158.
17. L. Zhang, J. L. Coffer, T Waldek Zerda, J. Sol-Gel Sci. Technol. 1998, 11, 267.
18. a) C. M. Hessel, E. X Henderson, J. G. C. Veinot, Chem. Mater. 2006, 18, 6139.
19. b) C. M. Hessel, E. J. Henderson, J. G. C. Veinot, J. Phys. Chem. C 2007, 111, 6956.
20. I. B. Baek, J. H. Yang, W. J. Cho, C. G. Ahn, K. Im, S. Lee, J. Vac. Sci. Technol. B 2005, 23, 3120.
21. A. Meldrum, A. Hryciw, A. N. MacDonald, C. Blois, K. Marsh, J. Wang, Q. Li, J. Vac. Sci. Technol. A 2006, 24, 713.
22. J. Wang, X. F. Wang, Quan Li, A. Hryciw, A. Meldrum, Philos. Mag. 2007, 87, 11.
23. A. Meldrum, A. Hryciw, N. MacDonald, C. Blois, T. Clement, R. DeCorby, J. Wang, Q. Li, J. Lumin., in press.