-
1
-
-
0032204331
-
Stress polarity dependence of the activation energy in time-dependent dielectric breakdown of thin gate oxides
-
Nov
-
K. Eriguchi and M. Niwa, "Stress polarity dependence of the activation energy in time-dependent dielectric breakdown of thin gate oxides," IEEE Electron Device Lett., vol. 19, no. 11, pp. 339-401, Nov. 1998.
-
(1998)
IEEE Electron Device Lett
, vol.19
, Issue.11
, pp. 339-401
-
-
Eriguchi, K.1
Niwa, M.2
-
2
-
-
0036865481
-
Voltage dependence of hard breakdown growth and the reliability implication in thin dielectrics
-
Nov
-
B. P. Linder, S. Lombardo, J. H. Stathis, A. Vayshenker, and D. Frank, "Voltage dependence of hard breakdown growth and the reliability implication in thin dielectrics," IEEE Electron Device Lett., vol. 23, no. 11, pp. 661-663, Nov. 2002.
-
(2002)
IEEE Electron Device Lett
, vol.23
, Issue.11
, pp. 661-663
-
-
Linder, B.P.1
Lombardo, S.2
Stathis, J.H.3
Vayshenker, A.4
Frank, D.5
-
3
-
-
0036494245
-
Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
-
Mar
-
B. Kaczer, R. Degraeve, M. Rasras, K. V. D. Mieroop, P. J. Roussel, and G. Groeseneken, "Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability," IEEE Trans. Electron Devices, vol. 49, no. 3, pp. 500-506, Mar. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.3
, pp. 500-506
-
-
Kaczer, B.1
Degraeve, R.2
Rasras, M.3
Mieroop, K.V.D.4
Roussel, P.J.5
Groeseneken, G.6
-
4
-
-
0347131290
-
Potential vulnerability of dynamic CMOS logic to soft gate oxide breakdown
-
Dec
-
B. Kaczer and G. Groesenken, "Potential vulnerability of dynamic CMOS logic to soft gate oxide breakdown," IEEE Electron Device Lett., vol. 24, no. 12, pp. 742-744, Dec. 2003.
-
(2003)
IEEE Electron Device Lett
, vol.24
, Issue.12
, pp. 742-744
-
-
Kaczer, B.1
Groesenken, G.2
-
5
-
-
3042557108
-
Effect of gate-oxide breakdown on RF performance
-
Sep
-
H. Yang, J. S. Yuan, T. Liu, and E. Xiao, "Effect of gate-oxide breakdown on RF performance," IEEE Trans. Device Mater. Rel., vol. 3, no. 3, pp. 93-97, Sep. 2003.
-
(2003)
IEEE Trans. Device Mater. Rel
, vol.3
, Issue.3
, pp. 93-97
-
-
Yang, H.1
Yuan, J.S.2
Liu, T.3
Xiao, E.4
-
6
-
-
0036712470
-
The impact of gate-oxide breakdown on SRAM stability
-
Sep
-
R. Rodriguez, J. H. Stathis, B. P. Kinder, S. Kowalczyk, C. T. Chaung, R. V. Joshi, G. Northorp, K. Bernstein, and A. J. Bhavnagarwala, "The impact of gate-oxide breakdown on SRAM stability," IEEE Electron Device Lett., vol. 23, no. 9, pp. 559-561, Sep. 2002.
-
(2002)
IEEE Electron Device Lett
, vol.23
, Issue.9
, pp. 559-561
-
-
Rodriguez, R.1
Stathis, J.H.2
Kinder, B.P.3
Kowalczyk, S.4
Chaung, C.T.5
Joshi, R.V.6
Northorp, G.7
Bernstein, K.8
Bhavnagarwala, A.J.9
-
7
-
-
3042652187
-
Experimental verification of SRAM cell functionality after hard and soft gate oxide breakdowns
-
B. Kaczer, R. Degraeve, E. Augendre, M. Jurczak, and G. Groeseneken, "Experimental verification of SRAM cell functionality after hard and soft gate oxide breakdowns," in Proc. Eur. Solid-State Device Res. 2003, pp. 75-78.
-
(2003)
Proc. Eur. Solid-State Device Res
, pp. 75-78
-
-
Kaczer, B.1
Degraeve, R.2
Augendre, E.3
Jurczak, M.4
Groeseneken, G.5
-
8
-
-
2342599663
-
CMOS RF and DC reliability subject to hot carrier stress and oxide soft breakdown
-
Mar
-
E. Xiao, J. S. Yuan, T. Liu, and H. Yang, "CMOS RF and DC reliability subject to hot carrier stress and oxide soft breakdown," IEEE Trans. Device Mater. Rel., vol. 4, no. 1, pp. 92-98, Mar. 2004.
-
(2004)
IEEE Trans. Device Mater. Rel
, vol.4
, Issue.1
, pp. 92-98
-
-
Xiao, E.1
Yuan, J.S.2
Liu, T.3
Yang, H.4
-
9
-
-
84886448127
-
Ultra-thin gate dielectrics: They breakdown, but do they fail?
-
B. E. Weir, P. J. Silverman, D. Monroe, K. S. Krisch, M. A. Alam, G. B. Alers, T. W. Sorsch, G. L. Timp, F. Baumann, C. T. Liu, Y. Ma, and D. Hwang, "Ultra-thin gate dielectrics: They breakdown, but do they fail?" in IEDM Tech. Dig., 1997, pp. 73-76.
-
(1997)
IEDM Tech. Dig
, pp. 73-76
-
-
Weir, B.E.1
Silverman, P.J.2
Monroe, D.3
Krisch, K.S.4
Alam, M.A.5
Alers, G.B.6
Sorsch, T.W.7
Timp, G.L.8
Baumann, F.9
Liu, C.T.10
Ma, Y.11
Hwang, D.12
-
10
-
-
0034453425
-
The statistical distribution of percolation resistance as a probe into the mechanics of ultra-thin oxide breakdown
-
M. A. Alam, B. E. Weir, P. J. Siverman, Y. Ma, and D. Hwang, "The statistical distribution of percolation resistance as a probe into the mechanics of ultra-thin oxide breakdown," in IEDM Tech. Dig., 2000, pp. 529-533.
-
(2000)
IEDM Tech. Dig
, pp. 529-533
-
-
Alam, M.A.1
Weir, B.E.2
Siverman, P.J.3
Ma, Y.4
Hwang, D.5
-
11
-
-
33747905416
-
Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications
-
Sep
-
R. Degraeve, B. Kaczer, A. D. Keersgieter, and G. Groeseneken, "Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications," IEEE Trans. Device Mater. Rel., vol. 1, no. 3, pp. 163-169, Sep. 2001.
-
(2001)
IEEE Trans. Device Mater. Rel
, vol.1
, Issue.3
, pp. 163-169
-
-
Degraeve, R.1
Kaczer, B.2
Keersgieter, A.D.3
Groeseneken, G.4
-
12
-
-
0036923374
-
Observation of hot-carrier-induced nFET gate-oxide breakdown in dynamically stress
-
B. Kaczer, F. Crupi, R. Degraeve, P. Roussel, C. Ciofi, and G. Groesenken, "Observation of hot-carrier-induced nFET gate-oxide breakdown in dynamically stress," in IEDM Tech. Dig., 2002, pp. 171-174.
-
(2002)
IEDM Tech. Dig
, pp. 171-174
-
-
Kaczer, B.1
Crupi, F.2
Degraeve, R.3
Roussel, P.4
Ciofi, C.5
Groesenken, G.6
-
13
-
-
0032664038
-
A 1.5 V, 10 bits, 14.3-MS/s CMOS pipeline analog-to-digital converter
-
May
-
A. M. Abo and P. R. Gray, "A 1.5 V, 10 bits, 14.3-MS/s CMOS pipeline analog-to-digital converter," IEEE J. Solid-State Circuits, vol. 34, no. 5, pp. 599-606, May 1999.
-
(1999)
IEEE J. Solid-State Circuits
, vol.34
, Issue.5
, pp. 599-606
-
-
Abo, A.M.1
Gray, P.R.2
-
14
-
-
3843092731
-
A 10-b 150-Msample/s 1.8-V 123-mW CMOS A/D converter with 400-MHz input bandwidth
-
Aug
-
J.-B. Park, S.-M. Yoo, S.-W. Kim, Y-J. Cho, and S.-H. Lee, "A 10-b 150-Msample/s 1.8-V 123-mW CMOS A/D converter with 400-MHz input bandwidth," IEEE J. Solid-State Circuits, vol. 39, no. 8, pp. 1335-1337, Aug. 2004.
-
(2004)
IEEE J. Solid-State Circuits
, vol.39
, Issue.8
, pp. 1335-1337
-
-
Park, J.-B.1
Yoo, S.-M.2
Kim, S.-W.3
Cho, Y.-J.4
Lee, S.-H.5
-
15
-
-
2442641370
-
A high-voltage output driver in a standard 2.5 V 0.25 μm CMOS technology
-
B. Serneels, T. Piessens, M. Steyaert, and W. Dehaene, "A high-voltage output driver in a standard 2.5 V 0.25 μm CMOS technology," in Proc. IEEE Int. Solid-State Circuits Conf. Dig. Tech. Papers, 2004, pp. 146-155.
-
(2004)
Proc. IEEE Int. Solid-State Circuits Conf. Dig. Tech. Papers
, pp. 146-155
-
-
Serneels, B.1
Piessens, T.2
Steyaert, M.3
Dehaene, W.4
-
17
-
-
28744444182
-
Impact of MOSFET gate-oxide reliability in CMOS operational amplifiers in a 130-nm low-voltage CMOS process
-
J.-S. Chen and M.-D. Ker, "Impact of MOSFET gate-oxide reliability in CMOS operational amplifiers in a 130-nm low-voltage CMOS process," in Proc. IEEE Int. Reliab. Phys. Symp., 2005, pp. 423-430.
-
(2005)
Proc. IEEE Int. Reliab. Phys. Symp
, pp. 423-430
-
-
Chen, J.-S.1
Ker, M.-D.2
-
18
-
-
13444262133
-
Impact of soft and hard breakdown on analog and digital circuits
-
Dec
-
A. Aevllan and W. H. Kraustschneider, "Impact of soft and hard breakdown on analog and digital circuits," IEEE Trans. Device Mater. Rel., vol. 4, no. 4, pp. 676-680, Dec. 2004.
-
(2004)
IEEE Trans. Device Mater. Rel
, vol.4
, Issue.4
, pp. 676-680
-
-
Aevllan, A.1
Kraustschneider, W.H.2
-
19
-
-
0030399345
-
Degradation and breakdown of thin silicon dioxide films under dynamic electrical stress
-
Dec
-
M. Nafria, J. Sune, D. Yelamos, and X. Aymerich, "Degradation and breakdown of thin silicon dioxide films under dynamic electrical stress," IEEE Trans. Electron Devices, vol. 43, no. 12, pp. 2215-2225, Dec. 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, Issue.12
, pp. 2215-2225
-
-
Nafria, M.1
Sune, J.2
Yelamos, D.3
Aymerich, X.4
-
20
-
-
0038732515
-
A model for gate-oxide breakdown in CMOS inverters
-
Feb
-
R. Rodriguez, J. H. Stathis, and B. P. Linder, "A model for gate-oxide breakdown in CMOS inverters," IEEE Electron Device Lett., vol. 24, no. 2, pp. 114-116, Feb. 2003.
-
(2003)
IEEE Electron Device Lett
, vol.24
, Issue.2
, pp. 114-116
-
-
Rodriguez, R.1
Stathis, J.H.2
Linder, B.P.3
|