Thermally induced viscous flow of borophosphosilicate-glass thin films on stepped surfaces, part 1: A review of quantitative studies on furnace and rapid thermal annealing

Russian Microelectronics

Volumn 32, Issue 3, 2003, Pages 125-135

  Vasilev, V Y ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; INTEGRATED CIRCUITS; MICROELECTRONICS; RAPID THERMAL ANNEALING; SILICATES; THIN FILMS; VISCOUS FLOW;

BOROPHOSPHOSILICATE GLASS (BPSG); FURNACE ANNEALING (FA); THERMAL GLASS FLOW;

BOROPHOSPHATE GLASS;

EID: 3543140741     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1023916502417     Document Type: Review

References (33)

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