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Volumn 44, Issue 3, 2001, Pages 129-130+132+134+136
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Trends in void-free pre-metal CVD dielectrics
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DIELECTRIC MATERIALS;
SEMICONDUCTING FILMS;
SEMICONDUCTING GLASS;
PRE-METAL DIELECTRIC (PMD) GAP-FILL PROCESSES;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0035278655
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
Times cited : (20)
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References (20)
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