Investigation of borophosphosilicate glass roughness and planarization with the atomic force microscope technique

Thin Solid Films

Volumn 352, Issue 1-2, 1999, Pages 77-84

  Tang, S K ^a   Vassiliev, V Y ^b   Mridha, S ^a   Chan, L H ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

Atomic force microscopy (AFM); Chemical vapor deposition (CVD); Silicon oxide; Surface defects

Indexed keywords

EID: 0004737837     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00353-3     Document Type: Article

References (30)

1. W. Kern, G.L. Schnable, RCA Rev. 43 (3) (1982) 423.
2. T.G. Duhanova, V.Y. Vassiliev, Y.I. Veretenin, (In Russian), Reviews on Electronic Technology, Series 3, 4(1370), Institute 'Electronics', Moscow, 1988.
3. V.Y. Vassiliev, Modern BPSG Film Technology. Visual booklet of short tutorial course of the 4th Int. Dielectric for ULSI Multilevel Interconnection Conf., 1998, p. 111.
4. K. Law, J. Wong, C. Leung, J. Olsen, D. Wang, Solid State Technol. 32 (4) (1989) 60.
5. W. Kern, W.A. Kurylo, C.J. Tino, RCA Rev. 46 (2) (1985) 153.
6. V.Y. Vassiliev, T.G. Duhanova, Electron. Ind. (in Russian) 3 (1988) 51.
7. V.Y. Vassiliev, T.G. Duhanova, Chem. Phys. (in Russian) 11 (12) (1992) 1699.
8. F.S. Becker, D. Pawlik, H. Anzinger, A. Spitzer, J. Vac. Sci. Technol. B 5 (6) (1987) 1555.
9. V.Y. Vassiliev, (In Russian), Reviews on Electronic Technology (Series 2), 3(1546), Institute 'Electronics', Moscow, 1990.
10. R.M. Levin, A.C. Adams, J. Electrochem. Soc. 129 (7) (1982) 1588.
11. K. Fujino, Y. Nishimoto, N. Tokumasu, K. Maeda, J. Electrochem. Soc. 137 (9) (1990) 2883.
12. K. Fujino, Y. Nishimoto, N. Tokumasu, K. Maeda, J. Electrochem. Soc. 138 (10) (1991) 3019.
13. Y. Ikeda, Y. Numasawa, M. Sakamoto, J. Electron. Mater. 19 (1) (1990) 45.
14. K. Fujino, Y. Nishimoto, N. Tokumasu, K. Maeda, J. Electrochem. Soc. 140 (10) (1993) 2922.
15. S. Robles, K. Russel, M. Galiano, V. Kithcart, B.C. Nguen, J. Electrochem. Soc. 143 (4) (1996) 1414.
16. V.Y. Vassiliev, J.-Z. Zheng, S.K. Tang, W. Lu, J. Hua, Y.S. Lin, J. Electrochem. Soc. (1999) in press.
17. D.S. Williams, E.A. Dean, J. Electrochem. Soc. 134 (3) (1987) 657.
18. Y.E. Strausser, D.L. Hetherington, Digital Instruments application note - tapping mode atomic force microscopy: applications to semi-conductors, 1994.
19. K. Fujino, Y. Nishimoto, N. Tokumasu, K. Maeda, J. Electrochem. Soc. 139 (6) (1992) 1690.
20. K. Kwok, E. Yieh, S. Robles, B.C. Nguyen, J. Electrochem.Soc. 141 (8) (1994) 2172.
21. V.Y. Vassiliev, L. Wei, J.-Z. Zheng, H.R. Wang, L. Chan, Proc. 3rd Int. Dielectric for ULSI Multilevel Interconnection Conference (1997) 171.
22. S.K. Tang, S. Mridha, V.Y. Vassiliev, J.-Z. Zheng, L. Chan, Proc. 7th Int. Symposium on IC Technology, Systems and Application, Singapore (1997) 601.
23. S.K. Tang, V.Y. Vassiliev, S. Mridha, L. Chan, Abstracts 44th National AVS Symposium (1997) 189.
24. S.K. Tang, V.Y. Vassiliev, S. Mridha, L. Chan, Proc. 4th Int. Dielectric for ULSI Multilevel Interconnection Conference (1998) 287.
25. J.L. Sudijono, V.Y. Vassiliev, J.-Z. Zheng, Proc. 7th Int. Symposium on IC Technology, Systems and Application, Singapore (1997) 597.
26. H. Rojhantalab, M. Moinpour, N. Peter, M.L.A. Dass, W. Hough, R. Natter, F. Moghadam, Proc. Mater. Res. Soc. Symp. 280 (1993) 147.
27. V.Y. Vassiliev, T.G. Duhanova, Proc. 194th Meeting of the Electrochemical Society 98-2 (1998) 807.
28. V.Y. Vassiliev, J.-Z. Zheng, Proc. 7th Int. Symposium on IC Technology, Systems and Application, Singapore (1997) 522.
29. V.Y. Vassiliev, J.-Z. Zheng, M. Liao, Y.S. Lin, Proc. 4th Int. Dielectric for ULSI Multilevel Interconnection Conference (1998) 90.
30. L.Q. Xia, E. Yieh, P. Gee, F. Campana, B.C. Nguyen, J. Electrochem. Soc. 144 (9) (1997) 3208.