Dielectric properties of hydrogen-incorporated chemical vapor deposited diamond thin films

Journal of Applied Physics

Volumn 102, Issue 7, 2007, Pages

  Liu, Chao ^a   Xiao, Xingcheng ^a   Wang, Jian ^a   Shi, Bing ^a   Adiga, Vivekananda P ^b   Carpick, Robert W ^c   Carlisle, John A ^d   Auciello, Orlando ^d  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c UNIVERSITY OF PENNSYLVANIA   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC PROPERTIES; GRAPHITIZATION; MICROWAVES; NANOCRYSTALLINE MATERIALS; THIN FILMS;

ELASTIC RECOIL DETECTION (ERD); MICROCRYSTALLINE DIAMOND (MCD); ULTRANANOCRYSTALLINE DIAMOND;

DIAMONDS;

EID: 35348906712     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2785874     Document Type: Article

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