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Volumn , Issue , 1998, Pages 247-254
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Dielectric characterization of microwave assisted chemically vapor deposited diamond
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CAPACITORS;
DIELECTRIC PROPERTIES OF SOLIDS;
FREQUENCY STABILITY;
OHMIC CONTACTS;
PERMITTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
POWER ELECTRONICS;
THERMAL EXPANSION;
THERMODYNAMIC STABILITY;
TUNGSTEN;
COHESIVE FREESTANDING FILMS;
DIAMOND CAPACITORS;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
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EID: 0032305796
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (16)
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