SCOPUS 정보 검색 플랫폼

Volumn 6519, Issue PART 1, 2007, Pages

Material design of negative-tone polyphenol resist for EUV and EB lithography

Author keywords

EB lithography; Lactonization; Negative tone; Polarity change; Polyphenol; Resist

Indexed keywords

CARBOXYLIC ACIDS; EXTREME ULTRAVIOLET LITHOGRAPHY; FUNCTIONAL GROUPS; OPTICAL RESOLVING POWER; PHENOLS; SWELLING;

EB LITHOGRAPHY; MONO-PROTECTED COMPOUND; NEGATIVE-TONE POLYPHENOL; NEGATIVE-TONE POLYPHENOL RESIST;

PHOTORESISTS;

EID: 35148893676 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.711759 Document Type: Conference Paper

Times cited : (8)

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