Optical measurements of silicon wafer temperature

Applied Surface Science

Volumn 254, Issue 1 SPEC. ISS., 2007, Pages 416-419

  Postava, K ^a,b   Aoyama, M ^a   Mistrik, J ^a,c   Yamaguchi, T ^a   Shio, K ^d  

^a SHIZUOKA UNIVERSITY   (Japan)

^b VSB TECHNICAL UNIVERSITY OF OSTRAVA   (Czech Republic)

^c UNIVERSITY OF PARDUBICE   (Czech Republic)

^d KOMATSU LTD   (Japan)

Author keywords

Ellipsometry; Non contact temperature measurement; Polarized reflectivity; Silicon wafer

Indexed keywords

ELLIPSOMETRY; ENERGY GAP; OXIDE FILMS; POLARIZATION; REFLECTION; TEMPERATURE MEASUREMENT; WAVELENGTH;

NON-CONTACT TEMPERATURE MEASUREMENT; POLARIZED REFLECTIVITY; TEMPERATURE SENSITIVITY;

SILICON WAFERS;

EID: 35148863170     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.07.086     Document Type: Article

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