In situ wafer temperature monitoring of silicon etching using diffuse reflectance spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2356-2360

  Booth, J L ^a   Beard, B T ^a   Stevens, J E ^b   Blain, M G ^b   Meisenheimer, T L ^b  

^a Thermionics NW Inc   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030503363     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580022     Document Type: Article

References (9)

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8. S. M. Sze, Physics of Semiconductor Devices (McGraw-Hill, New York, 1981) Appendix H.
9. T. P. Pearsall, S. R. Saban, J. L. Booth, B. T. Beard, and S. R. Johnson, Rev. Sci. Instrum. 66, 4977 (1995).