Pulse-modulated infrared-laser interferometric thermometry for non-contact silicon substrate temperature measurement

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 2035-2042

  Kikuchi, Jun ^a   Fujimura, Shuzo ^a   Kurosaki, Ryo ^a   Yano, Hiroshi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031524032     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580676     Document Type: Article

References (4)

1. V. M. Donnelly and J. A. McCaulley, J. Vac. Sci. Technol. A 8, 84 (1990).
2. V. M. Donnelly, J. Vac. Sci. Technol. A 11, 2393 (1993).
3. K. L. Saenger. F. Tong, J. S. Logan, and W. H. Holber, Rev. Sci. Instrum. 63, 3862 (1992).
4. V. M. Donnelly, Appl. Phys. Lett. 63, 1396 (1993).