Through pitch correction of scattering effects in 193 nm alternating phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 348-358

  Burkhardt, M ^a   Gordon, R ^a   Hibbs, M ^a   Brunner, T A ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Lithography; Microlithography; MSM 193; Phase shifing masks; Simulation; TEMPEST

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ERRORS; LIGHT SCATTERING; MASKS; PHASE SHIFT;

PHASE SHIFTING MASKS;

LITHOGRAPHY;

EID: 0036410439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474584     Document Type: Conference Paper

References (9)

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