Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 563-571

  Takenoshita, Kazutoshi ^a   Koay, Chiew Seng ^a   Teerawattansook, Somsak ^a   Richardson, Martin ^a   Bakshi, Vivek ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b SEMATECH   (United States)

Author keywords

Debris measurements; EUV Source; Laser plasmas; Mitigation; Tin plasma

Indexed keywords

DEBRIS MEASUREMENTS; EUV SOURCES; LASER-PLASMAS; MITIGATION; TIN PLASMA;

DEBRIS; ION BEAMS; LASER PRODUCED PLASMAS; MIRRORS; SEMICONDUCTOR DOPING; TIN; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 24644467189     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596764     Document Type: Conference Paper

References (12)

1. M. Richardson, C-S Koay, K. Takenoshita, C. Keyser, "High conversion efficiency mass-limited Sn-based laser plasma source for EUV lithography," Journal of Vacuum Science and Technology B, volume 22, number 2, pages 785-790, 2004.
2. J. Pankert, "Philips' EUV lamp: Status and Roadmap," presentation at ISMT EUV source workshop, Sep. 29, 2003.
3. G. Schriever, M. C. Richardson, E. Turcu, "The droplet laser plasma source for EUV lithography," Proceedings of CLEO, pages 393-394, 7-12 May 2000.
4. Y. Watanabe, "Source requirements," presentation at ISMT EUV source workshop, Feb. 22, 2004.
5. K. Takenoshita, M. C. Richardson et al., "The repeller field debris mitigation approach for EUV sources," Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 792-800, 2003.
6. W. T. Silfvast, M. C. Richardson et al., "Laser-Produced Plasmas for Soft X-ray Projection Lithography," Journal of Vacuum Science and Technology B, volume 10, number 6, pages 3126-3133, 1992.
7. L. A. Shmaenok, R. de Bruijn, R. Stuik, F. Bikerk, et al., SPIE Vol. 3331, pp. 90-95, 1998
8. M. Richardson et al., "Characterization and control of laser-plasma flux parameters for soft x-ray projection lithography". Applied Optics Vol. 32, pp. 6901-6910, 1993.
9. H. Yashiro et al., "Study of ultra-fast ion shutter employing a laser-produced plasma," Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 759-766, 2003.
10. H. Komori et al., "Ion damage analysis on EUV collector mirrors," Emerging Lithographic Technologies VIII, SPIE, volume 5374, pages 839-846, 2004.
11. M. Richardson and G. Schriever, US Patent 6,377,651, (2002).
12. K. Takenoshita, C-S Koay, S. Teerawattanasook, M. Richardson, "Debris studies for the tin-based droplet laser-plasma EUV source," Emerging Lithographic Technologies VIII, volume 5374, pages 954-963, 2004.