Integration of the reticle systematic CD errors into an OPC modeling and correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Han, Geng ^a   Mansfield, Scott ^a   Krasnoperova, Azalia ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Critical dimension (CD); Mask proximity correction (MPC); Optical proximity correction (OPC)

Indexed keywords

CRITICAL DIMENSION (CD); MASK EFFECT; MASK PROXIMITY CORRECTION (MPC); OPTICAL PROXIMITY CORRECTION (OPC);

CALIBRATION; INTEGRATION; MATHEMATICAL MODELS; OPTICAL DEVICES;

SYSTEMATIC ERRORS;

EID: 33745790059     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657194     Document Type: Conference Paper

References (8)

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8. A. Barberet, et. al, "Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: optical mask writing tool simulation", Proc. of SPIE, Vol 4562, pp. 511-521, 2002.