Multilayer defects nucleated by substrate pits: A comparison of actinic inspection and non-actinic inspection techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Barty, A ^a   Goldberg, K A ^b   Kearney, P ^c   Rekawa, S B ^b   LaFontaine, B ^d   Wood II, O ^c   Taylor, J S ^a   Han, H S ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c SEMATECH   (United States)

^d ADVANCED MICRO DEVICES   (United States)

Author keywords

EUV mask inspection; EUV reticle; Programmed defects

Indexed keywords

EUV MASK INSPECTION; EUV RETICLE; PROGRAMMED DEFECTS;

CORRELATION METHODS; INSPECTION; LITHOGRAPHY; MICROSCOPIC EXAMINATION; NUCLEATION; SUBSTRATES;

CRYSTAL DEFECTS;

EID: 33846563056     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686742     Document Type: Conference Paper

References (5)

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3. A.Barty, J.S.Taylor, R.Hudyma, E.Spiller, D.W.Sweeney, G.Shelden and J-P Urbach, "Aerial image microscopes for the inspection of defects in EUV masks" (2002) 1889 Proc. SPIE 1073.
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