Repair of phase defects in extreme-ultraviolet lithography mask blanks

Journal of Applied Physics

Volumn 96, Issue 11, 2004, Pages 6812-6821

  Hau Riege, Stefan P ^a   Barty, Anton ^a   Mirkarimi, Paul B ^a   Baker, Sherry ^a   Coy, Michael A ^b   Mita, Masaaki ^b   Robertson, Vernon E ^b   Liang, Ted ^c   Stivers, Alan ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b JEOL USA INC   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL RESPONSE; MKASK BLANK; PHASE DEFECTS; SILICIDES;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; IMAGE SEGMENTATION; MULTILAYERS; REFLECTION; ULTRAVIOLET RADIATION;

POINT DEFECTS;

EID: 33845675783     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1812826     Document Type: Article

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