SCOPUS 정보 검색 플랫폼

Volumn 75, Issue 4, 2004, Pages 345-351

Fabrication of step and flash imprint lithography templates using a variable shaped-beam exposure tool

Author keywords

Imprint lithography; SFIL; Shaped beam; Template

Indexed keywords

COMPUTATIONAL GEOMETRY; DATA REDUCTION; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; FABRICATION; PRESSURE EFFECTS; SILICON; THERMAL EFFECTS;

IMPRINT LITHOGRAPHY; SHAPED-BEAM; STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL); TEMPLATE;

PHOTORESISTS;

EID: 7544223599 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2004.06.007 Document Type: Article

Times cited : (10)

References (8)

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7
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- Kalk, F.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.