EUVL mask substrate defect print study

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Cullins, Jerry ^a   Tezuka, Yoshihiro ^a   Nisiyama, Iwao ^a   Hashimoto, Takeo ^a   Shoki, Tsutomu ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b HOYA CORPORATION   (Japan)

Author keywords

EUV; Extreme ultraviolet lithography; Mask; Multi layer deposition; Photomask; Substrate defects

Indexed keywords

COMPUTER SIMULATION; DEFECTS; DEPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE RECONSTRUCTION; MULTILAYERS;

MULTILAYER DEPOSITION; SUBSTRATE DEFECTS;

PHOTOMASKS;

DEFECTS; DEPOSITION; LITHOGRAPHY; MULTILAYERS; SIMULATION;

EID: 35148859331     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714358     Document Type: Conference Paper

References (0)