Polarization effects associated with hyper-numerical-aperture (>1) lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 3, 2005, Pages

  Flagello, Donis ^a   Geh, Bernd ^a,b   Hansen, Steve ^a   Totzeck, Michael ^b  

^a ASML US Inc   (United States)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Hyper numerical aperture; Imaging; Immersion; Lithography; Polarization

Indexed keywords

HYPER NUMERICAL APERTURE; IMMERSION TECHNOLOGY; MICROPOLARIZATION; NUMERICAL APERTURE;

APPROXIMATION THEORY; BIREFRINGENCE; COMPUTER SIMULATION; IMAGING TECHNIQUES; LIGHTING; POLARIZATION;

LITHOGRAPHY;

EID: 33644758576     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2039081     Document Type: Article

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