Enabling the 45nm node by hyper-NA polarized lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  De Boeij, Wim ^a   Swinkels, Geert ^a   Le Masson, Nicolas ^a   Koolen, Armand ^a   Van Greevenbroek, Henk ^a   Klaassen, Michel ^a   Van De Kerkhof, Mark ^a   Van Ingen Schenau, Koen ^a   De Winter, Laurens ^a   Wehrens, Martijn ^a   Hansen, Steve ^a   Wagner, Christian ^a  

^a ASML   (Netherlands)

Author keywords

45nm node; 65nm node; ArF Step Scan lithography; High NA; Hyper NA; Immersion; Lithography; Optical birefringence; Polarimetry; Polarization

Indexed keywords

BIREFRINGENCE; COMPUTER SIMULATION; IMAGING SYSTEMS; LIGHT POLARIZATION; OPTICAL RESOLVING POWER; POLARIMETERS;

45NM NODE; 65NM NODE; ARF STEP&SCAN LITHOGRAPHY; HIGH-NA; HYPER-NA; IMMERSION; OPTICAL BIREFRINGENCE;

PHOTOLITHOGRAPHY;

EID: 33745771738     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659006     Document Type: Conference Paper

References (11)

1. D. Gil et.al., Immersion Lithography: New Opportunities for Semiconductor Manufacturing, J. Vac. Sci. Techn. B 22(6), 2004.
2. J.H. Chen et.al., Characterization of ArF Immersion process for Production, SPIE Vol. 5754, 2005.
3. B. Streefkerk et al., Extending Optical Lithography with Immersion, SPIE Vol. 5377, 2004.
4. D.G. Flagello et al., Optimizing and Enhancing Optical Systems to Meet the Low k1 Challenge, SPIE 2003.
5. C. Kohler et.al., Imaging enhancements by Polarization Illumination: Theory and Practice, SPIE, Vol 5754, 2005.
6. D. Flagello et al. Optical Lithography in the sub-50nm regime. SPIE, vol.5377, pp21-33, 2004.
7. A. Erdmann. Mask Modeling in the Low k1 and Ultrahigh NA Regime: Phase and Polarization Effects. BACUS News, Photomask, Vol 21 issue 4, 2005.
8. A.K. Wong and A. Neurether, Edge effects in phase-shifting masks for 0.25μm Lithography. Proc. SPIE 1809, p. 222, 1992
9. Bernd Geh et al., The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging, Proc. SPIE Vol. 5992, p. 317-331, 2005.
10. M. van de Kerkhof et al., Mask substrate requirements for hyper-NA lithography, ML6154-159, SPIE, 2006.
11. Hans Jasper et al., Optical lithography with ultra- high NA immersion system, ML6154-69, SPIE, 2006.