The impact of mask birefringence on Hyper-NA (NA>1.0) polarized imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Geh, Bernd ^a   Flagello, Bonis G ^a   Progier, Chris ^b   Martin, Patrick M ^b   Leonardus, H A ^c   Leunissen, Steve Hansen ^c   De Boeij, Wim ^d  

^a ASML US Inc   (United States)

^b PHOTRONICS INC   (United States)

^c IMEC   (Belgium)

^d ASML   (Netherlands)

Author keywords

193nm; High NA; Hyper NA; Imaging; Immersion; Low k1; Mask birefringence; Polarization; Stokes parameters

Indexed keywords

HIGH NA; HYPER NA; IMMERSION; MASK BIREFRINGENCE; STOKES PARAMETERS;

BIREFRINGENCE; ILLUMINATING ENGINEERING; IMAGING SYSTEMS; LIGHT POLARIZATION; SUBSTRATES;

MASKS;

EID: 33644592195     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637483     Document Type: Conference Paper

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