Negative photoresist for 157 nm microlithography: A progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 622-626

  Conley, Will ^a   Trinque, Brian ^b   Miller, Daniel ^a   Caporale, Stefan ^b   Osborn, Brian ^b   Kumamoto, Shiro ^b   Pinnow, Matthew ^b   Callahan, Ryan ^b   Chambers, Charles ^b   Lee, Guen Su ^a   Zimmerman, Paul ^a   Willson, C Grant ^b  

^a SEMATECH   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; FLUORINE CONTAINING POLYMERS; MASKS; PHOTOLITHOGRAPHY; SPECTROSCOPY; SYNTHESIS (CHEMICAL); TRANSPARENCY;

CROSSLINKERS; PHASE SHIFTING MASKS;

PHOTORESISTS;

EID: 0141834695     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485194     Document Type: Conference Paper

References (1)

1. Patterson, K.; Yamachika, M.; Hung, R.; Brodsky, C.; Yamada, S.; Somervell, M.; Osborn, B.; Hall, D.; Dukovic, G.; Byers, J.; Conley, W.; Willson, C. G. Proc. SPIE 2000, 3999, 365-374.