Study of tribochemical processes on hard disks using photoemission electron microscopy

Journal of Tribology

Volumn 121, Issue 4, 1999, Pages 961-967

  Anders, Simone ^a   Stammler, Thomas ^a   Fong, Walton ^b   Chen, Chao Yuan ^b   Bogy, David B ^b   Bhatia, C Singh ^c   Stöhr, Joachim ^d  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c IBM   (United States)

^d IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL BONDS; CHEMICAL MODIFICATION; DEGRADATION; ELECTRON MICROSCOPY; LUBRICANTS; PHOTOEMISSIVE DEVICES; TRIBOLOGY; WEAR OF MATERIALS; X RAY SPECTROSCOPY;

MOLECULE SCISSION; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE (NEXAFS) SPECTROSCOPY; PHOTOEMISSION ELECTRON MICROSCOPY (PEEM);

HARD DISK STORAGE;

ELECTRON MICROSCOPY; MAGNETIC DISC; WEAR;

EID: 0033201547     PISSN: 07424787     EISSN: 15288897     Source Type: Journal    
DOI: 10.1115/1.2834162     Document Type: Article

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