Effect of base and oxygen partial pressures on the electrical and optical properties of indium molybdenum oxide thin films

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8549-8552

  Elangovan, E ^a   Martins, R ^a   Fortunato, E ^a  

^a Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

Annealing; Indium oxide; Molybdenum doping; Optical properties; Radio frequency sputtering; Thin films; X ray diffraction

Indexed keywords

ANNEALING; DOPING (ADDITIVES); INDIUM COMPOUNDS; MOLYBDENUM; OPTICAL PROPERTIES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

INDIUM MOLYBDENUM OXIDE THIN FILMS; MOLYBDENUM DOPING; OXYGEN PARTIAL PRESSURES;

OXIDE FILMS;

EID: 34548859521     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.127     Document Type: Article

References (25)

1. Lewis B.G., and Paine D.C. MRS Bull. 25 (2000) 22
2. Li X., Wanlass M.W., Gessert T.A., Emery K.A., and Coutts T.J. Appl. Phys. Lett. 54 (1989) 2674
3. Meng Y., Yang X.L., Chen H.X., Shen J., Jiang Y.M., Zhang Z.J., and Hua Z.Y. Thin Solid Films 394 (2001) 219
4. Li X., Miao W., Zhang Q., Huang L., Zhang Z., and Hua Z. J. Mater. Res. 20 (2005) 1404
5. Yoshida Y., Gesert T.A., Perkins C.L., and Coutts T.J. J. Vac. Sci. Technol., A 21 (2003) 1092
6. Yeom H.Y., Popovich N., Chason E., and Paine D.C. Thin Solid Films 411 (2002) 17
7. Morgan D.V., Aliyu Y.H., Bunce R.W., and Salehi A. Thin Solid Films 312 (1998) 268
8. Frank G., and Köstlin H. Appl. Phys., A Solids Surf. 27 (1982) 197
9. Meng Y., Yang X.L., Chen H.X., Shen J., Jiang Y.M., Zhang Z.J., and Hua Z.Y. J. Vac. Sci. Technol., A 20 (2002) 288
10. Miao W., Li X., Zhang Q., Huang L., Zhang Z., Zhang L., and Yan Z. Thin Solid Films 500 (2006) 70
11. Sun S.Y., Huang J.L., and Lii D.F. J. Mater. Res. 20 (2005) 247
12. Sun S.Y., Huang J.L., and Lii D.F. J. Vac. Sci. Technol., A 22 (2004) 1235
13. Huang L., Li X., Zhang Q., Miao W., Yan X., Zhand Z., and Hua Z. J. Vac. Sci. Technol., A 23 (2005) 1350
14. Li X., Miao W., Zhang Q., Huang L., Zhang Z., and Hua Z. Semicond. Sci. Technol. 20 (2005) 823
15. Sun S.Y., Huang J.L., and Lii D.F. Thin Solid Films 469-470 (2004) 6
16. Coutts T.J., Young D.L., and Li X. MRS Bull. 135 (2000) 140
17. Dawar A.L., and Joshi J.C. J. Mater. Sci. 19 (1984) 1
18. Wu W.F., and Chiou B.S. Thin Solid Films 247 (1994) 201
19. Matsuoka T., Kuwata J., Fujita Y., and Abe A. Jpn. J. Appl. Phys. 27 (1988) L1199
20. Ishida T., Kobayashi H., and Nakato Y. J. Appl. Phys. 73 (1993) 4344
21. Pankove J.I. Optical Processes in Semiconductors (1971), Prentice-Hall, NJ 34
22. Burstein L. Phys. Rev. 93 (1954) 632
23. Moss T.S. Proc. Phys. Soc., London, Sect. A 382 (1954) 775
24. Aperathitis E., Bender M., Cimala V., Ecke G., and Modreamu M. J. Appl. Phys. 94 (2003) 1258
25. Granqvist C.G., and Hultake A. Thin Solid Films 411 (2002) 1