CF3 interaction with Si(1 0 0)-(2 × 1): Molecular dynamics simulation

Surface Science

Volumn 601, Issue 18, 2007, Pages 4250-4255

  Gou, F ^a   Gleeson, M A ^b   Kleyn, A W ^a,b  

^a LEIDEN UNIVERSITY   (Netherlands)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

CF3; Etching; Molecular dynamics; Si(1 0 0)

Indexed keywords

COMPUTER SIMULATION; ELECTROCHEMICAL ETCHING; FLUOROCARBONS; MOLECULAR DYNAMICS; REACTION RATES;

ENERGY-DEPENDENT INTERACTIONS; FLUOROSILYL; MOLECULAR DYNAMICS SIMULATIONS; TERSOFF-BRENNER POTENTIALS;

MOLECULAR INTERACTIONS;

EID: 34548723814     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.200     Document Type: Article

References (25)

1. Chang J.P., and Coburn J.W. J. Vac. Sci. Technol. A 21 (2003) S145
2. Oehrlein G.S. J. Vac. Sci. Technol. A 11 (1993) 34
3. Winters H.F., and Coburn J.W. Surf. Sci. Rep. 14 (1992) 161
4. Abrams C.F., and Graves D.B. J. Vac. Sci. Technol. A 16 (1998) 3006
5. Gou F., Gleeson M.A., Villette J., and Kleyn A.W. Nucl. Instrum. Methods Phys. Res. B 247 (2006) 244
6. Abrams C.F., and Graves D.B. J. Vac. Sci. Technol. A 19 (2001) 175
7. Stillinger F.H., and Weber T.A. J. Chem. Phys. 88 (1988) 5123
8. Stillinger F.H., and Weber T.A. Phys. Rev. Lett. 62 (1989) 2144
9. Schoolcraft T.A., and Garrison B.J. J. Am. Chem. Soc. 113 (1991) 8221
10. Feil H., Dieleman J., and Garrison B.J. J. Appl. Phys. 74 (1993) 1303
11. Brenner D.W. Phys. Rev. B 42 (1990) 9458
12. Tersoff J. Phys. Rev. B 38 (1988) 9902
13. Tersoff J. Phys. Rev. B 37 (1988) 6991
14. Tersoff J. Phys. Rev. B 39 (1989) 5566
15. Abrams C.F., and Graves D.B. J. Appl. Phys. 86 (1999) 5938
16. Humbird D., and Graves D.B. J. Appl. Phys. 96 (2004) 791
17. Humbird D., and Graves D.B. J. Chem. Phys. 120 (2004) 2405
18. Schoolcraft T.A., Diehl A.M., Steel A.B., and Garrison B.J. J. Vac. Sci. Technol. A 13 (1995) 1861
19. Thomas A.W., and Frank H.S. J. Chem. Phys. 92 (1990) 6239
20. Swope W.C., Andersen H.C., Berens P.H., and Wilson K.R. J. Chem. Phys. 76 (1982) 637
21. Berendsen H.J.C., Postma J.P.M., Gunsteren W.F.v., DiNola A., and Haak J.R. J. Chem. Phys. 81 (1984) 3684
22. Abrams C.F., and Graves D.B. Thin Solid Films 374 (2000) 150
23. Humbird D., and Graves D.B. Plasma Sources Sci. Technol. 13 (2004) 548
24. Harper J.M.E., Cuomo J.J., Leary P.A., Summa G.M., Kaufman H.R., and Bresnock F.J. J. Electrochem. Soc. 128 (1981) 1077
25. Toyoda H., Morishima H., Fukute R., Hori Y., Murakami I., and Sugai H. J. Appl. Phys. 95 (2004) 5172