Three-dimensional atomic-scale mapping of Pd in Ni1-x Pdx SiSi (100) thin films

Applied Physics Letters

Volumn 91, Issue 11, 2007, Pages

  Kim, Yeong Cheol ^a   Adusumilli, Praneet ^b   Lauhon, Lincoln J ^b   Seidman, David N ^b   Jung, Soon Yen ^c   Lee, Hi Deok ^c   Alvis, Roger L ^d   Ulfig, Rob M ^d   Olson, Jesse D ^d  

^a Korea University of Technology and Education   (South Korea)

^b Northwestern University   (United States)

^c Chungnam National University   (South Korea)

^d Imago Scientific Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MOS DEVICES; PALLADIUM; STABILIZATION; SUBSTRATES; SURFACE ROUGHNESS; TOMOGRAPHY;

ATOM-PROBE TOMOGRAPHY; DRAIN CONTACTS; MONOSILICIDE STABILIZATION;

THIN FILMS;

EID: 34548682801     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2784196     Document Type: Article

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