X-ray reflectivity and photoelectron spectroscopy study of interdiffusion at the Si/Fe interface

Journal of Applied Physics

Volumn 100, Issue 1, 2006, Pages

  Naik, S R ^a   Rai, S ^a   Lodha, G S ^a   Brajpuriya, R ^b  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; INTERDIFFUSION (SOLIDS); IRON; SILICON; SURFACE ROUGHNESS; THICKNESS CONTROL; X RAY PHOTOELECTRON SPECTROSCOPY;

BILAYERS; ELECTRON BEAM DEPOSITION; INTERLAYER THICKNESS; X RAY REFLECTIVITY;

INTERFACES (MATERIALS);

EID: 33746216138     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2210168     Document Type: Article

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