Development of X-shape filtered arc deposition apparatus for thick ta-C film coating

IEEJ Transactions on Fundamentals and Materials

Volumn 126, Issue 8, 2006, Pages 757-762

  Hikokasa, Hiroki ^a   Iwasaki, Tasuhiro ^a   Takikawa, Hirofumi ^a   Sakakibara, Tateki ^a   Hasegawa, Hiroshi ^b,c   Tsuji, Nobuhiro ^b,c  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b Onward Ceramic Coating Co Ltd   (Japan)

^c Onward Ceramic Coating Co Ltd   (Japan)

Author keywords

Binding interlayer; Cr film; Hydrogen free DLC(ta C) film; Superhard alloy; X shape filtered arc deposition (T FAD)

Indexed keywords

BINDING INTERLAYER; CR FILM; HYDROGEN-FREE DLC(TA-C) FILM; SUPERHARD ALLOY; X-SHAPE FILTERED ARC DEPOSITION (T-FAD);

AMORPHOUS FILMS; CARBON; DEPOSITION; DIAMOND LIKE CARBON FILMS; GRAPHITE ELECTRODES; PLASMA APPLICATIONS;

CHROMIUM;

EID: 33746928248     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.126.757     Document Type: Review

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