Thick Pb (Zr,Ti) O3 film without substrate

Applied Physics Letters

Volumn 91, Issue 7, 2007, Pages

  Lee, Jae Wung ^a   Park, Chee Sung ^a   Jo, Ji Hoon ^a   Kim, Hyoun Ee ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; MEMS; OXIDATION; SUBSTRATES;

CLAMPING EFFECT; RF-MAGNETRON SPUTTERING;

THICK FILMS;

EID: 34548016316     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2771377     Document Type: Article

References (14)

1. D. L. Polla and L. F. Francis, MRS Bull. 21, 59 (1996).
2. Y. L. Tu and S. J. Milne, J. Mater. Res. 11, 2556 (1996).
3. H. Daniel Chen, K. R. Udayakumar, C. J. Gaskey, L. E. Cross, J. J. Bernstein, and L. C. Niles, J. Am. Ceram. Soc. 79, 2189 (1996).
4. D. L. Corker, Q. Zhang, R. W. Whatmore, and C. Perrom, J. Eur. Ceram. Soc. 22, 383 (2002).
5. R. Seveno, P. Limousin, D. Averty, J.-L. Chartier, R. Le Bihan, and H. W. Gundel, J. Eur. Ceram. Soc. 20, 2025 (2000).
6. Xi-Yun He, Ai-Li Ding, Xin-Sen Zheng, Ping-Sun Qiu, and Wei-Gen Luo, Microelectron. Eng. 66, 865 (2003).
7. J. V. Biggers, T. R. Shrout, and W. A. Schulze, Ceram. Bull. 58, 516 (1979).
8. Y. B. Jeon, J. S. Chung, and K. S. No, J. Electroceram. 4, 195 (2000).
9. Jae-Wung Lee, Jong-Jin Choi, Gun-Tae Park, Chee-Sung Park, and Hyoun-Ee Kim, J. Mater. Res. 20, 2898 (2005).
10. D. Royer and V. Kmetik, Electron. Lett. 28, 1828 (1992).
11. A. L. Kholkin, Ch. Wütchrich, D. V. Taylor, and N. Setter, Rev. Sci. Instrum. 67, 1935 (1966).
12. Z. Wang, W. Zhu, C. Zhao, and O. K. Tan, Mater. Sci. Eng., B 99, 56 (2003).
13. S. Gebhardt, L. Seffner, A. Schönecker, J. Rödel, W. Beckert, W. Kreher, A. Sotnikov, W. Häßler, S. Reuter, and A. Hübler, J. Eur. Ceram. Soc. 24, 1101 (2004).
14. B. Jaffe, W. R. Cook, Jr., and H. Jaffe, Piezoelectric Ceramics (Academic, London, UK, 1971), pp. 140-147.