Etching of poly(tetrafluoroethylene) sheet by synchrotron radiation exposure in soft X-ray region

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 A, 2006, Pages 7978-7979

  Kato, Yuri ^a   Kanda, Kazuhiro ^a   Haruyama, Yuichi ^a   Matsui, Shinji ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Direct photoetching; Etching rate; Order of reaction; Poly(tetrafluoroethylene); Substrate temperature dependence; Synchrotron radiation

Indexed keywords

ETCHING; REACTION KINETICS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

DIRECT PHOTOETCHING; ELECTRON CURRENTS; ETCHING RATE; SUBSTRATE TEMPERATURE DEPENDENCE;

POLYTETRAFLUOROETHYLENES;

EID: 34547913111     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7978     Document Type: Article

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