Deposition of highly oriented Teflon thin films by synchrotron radiation etching

Journal of Electron Spectroscopy and Related Phenomena

Volumn 119, Issue 2-3, 2001, Pages 247-253

  Zhang, Y ^a   Katoh, T ^a   Endo, A ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Oriented film; Synchrotron radiation etching; Teflon film

Indexed keywords

CRYSTAL ORIENTATION; ETCHING; LASER ABLATION; POLYTETRAFLUOROETHYLENES; SPUTTER DEPOSITION; SUBSTRATES; SYNCHROTRON RADIATION; THIN FILMS;

POLYMER CHAINS;

PLASTIC FILMS;

EID: 0035426791     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(01)00300-0     Document Type: Article

References (14)