Synchrotron radiation direct photo-etching of polymers and crystals for micromachining

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 1153-1156

  Katoh, T ^a   Zhang, Y ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

High aspect ratios; Micromachining; Optical crystals; Synchrotron radiation direct etching; Teflon polymers

Indexed keywords

EID: 0032363296     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049597017627     Document Type: Article

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