Characteristics of a multilayer SiOx(CH)yN z film deposited by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane/Ar/N2O

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8430-8434

  Lee, June Hee ^a   Jeong, Chang Hyun ^a   Lim, Jong Tae ^a   Zavaleyev, Viktor A ^a   Kyung, Se Jin ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Diffusion barrier; HMDS; N2O; PECVD; SiO2

Indexed keywords

DIFFUSION BARRIERS; MULTILAYER FILMS; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

HEXAMETHYLDISILAZANE; ORGANIC DEVICES; THIN FILM PASSIVATION;

SILICON COMPOUNDS;

EID: 34547896645     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8430     Document Type: Article

References (19)

1. D. S. Wuu, W. C. Lo, C. C. Chiang, H. B. Lin, L. S. Chang, R. H. Horng, C. L. Huang and Y. J. Gao: Surf. Coat. Technol. 198 (2005) 114.
2. M. I. Alayo, D. Criado, L. C. D. Goncalves and I. Pereyra: J. Non-Cryst. Solids 338 (2004) 76.
3. L. S. Hung and C. H. Chen: Mater. Sci. Eng. R39 (2002) 143.
4. H. Lifka, H. A. van Esch and J. J. W. M. Rosink: SID Int. Symp. Dig. Tech. Pap. 35 (2004) 1384.
5. J. S. Jung, J. Y. Kwon, Y. S. Park, D. Y. Kim, H. S. Cho, K. B. Park, W. Xianyu, H. Yin and T. Noguchi: J. Korean Phys. Soc. 45 (2004) S861.
6. J. Y. Lee and S. H. Lee: J. Korean Phys. Soc. 45 (2004) 558.
7. Y. Liew, H. Aziz, N. Hu, H. S. Chan, G. Xu and Z. Popovic: Appl. Phys. Lett. 77 (2000).
8. B. H. Cumpston, I. D. Parker and K. F. Jensen: J. Appl. Phys. 81 (1997) 3716.
9. J. H. Lee, C. H. Jeong, J. T. Lim, N. G. Jo, S. J. Kyung and G. Y. Yeom: Surf. Coat. Technol. 200 (2005) 680.
10. C. H. Jeong, J. H. Lee, J. T. Lim, N. G. Cho, C. H. Moon and G. Y. Yeom: Jpn. J. Appl. Phys. 44 (2005) 1022.
11. S. C. Deshmukh and E. S. Aydil: Appl. Phys. Lett. 65 (1994) 3185.
12. R. Gonzalez-Luna, M. T. Rodrigo, C. Jimenez and J. M. Martinez-Duart: Thin Solid Films 317 (1988) 347.
13. S. J. Kyung, M. Voronko, J. H. Lee and G. Y. Yeom: J. Korean Phys. Soc. 47 (2005) 818.
14. S. W. Hsieh, C. Y. Chang and S. C. Hsu: J. Appl. Phys. 74 (1998) 2638.
15. R. G. Luna, M. T. Rodrigo, C. Jimenez and J. M. Martinez-Duart: Thin Solid Films 317 (1998) 347.
16. W. S. Liao, C. H. Lin and S. C. Lee: Appl. Phys. Lett. 65 (1994) 2229.
17. D. Criado, M. I. Alayo, I. Pereyra and M.. C. A. Fantini: Mater. Sci. Eng. B 112 (2004) 123.
18. M. T. Kim and J. Lee: Thin Solid Films 303 (1997) 173.
19. L.-Y. Chen and F. C.-N. Hong: Appl. Phys. Lett. 82 (2003) 3526.