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Journal of Applied Physics

Volumn 74, Issue 4, 1993, Pages 2638-2648

Characteristics of low-temperature and low-energy plasma-enhanced chemical vapor deposited SiO2

(3) Hsieh, S W a Chang, C Y a Hsu, S C a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449007962 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.354655 Document Type: Article

Times cited : (42)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.