Silicon complementary metal-oxide-semiconductor field-effect transistors with dual work function gate

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 12, 2006, Pages 9033-9036

  Na, Kee Yeol ^a   Kim, Yeong Seuk ^a  

^a Chungbuk National University   (South Korea)

Author keywords

CMOS; Drain conductance; Dual work function gate (DWFG); Transconductance

Indexed keywords

DRAIN CURRENT; FIELD EFFECT TRANSISTORS; MOSFET DEVICES; POLYSILANES; TRANSCONDUCTANCE;

CARRIER DRIFT VELOCITY; DRAIN CONDUCTANCE; DUAL WORK FUNCTION GATE (DWFG);

CMOS INTEGRATED CIRCUITS;

EID: 34547891096     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.9033     Document Type: Article

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