Gas residence time effects on plasma parameters: Comparison between Ar and C4F8

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 5 A, 2001, Pages 3419-3426

  Doh, H H ^a   Horiike, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

EEDF; QMA; Reaction rate coefficient; Residence time; TRGs OES

Indexed keywords

ADSORPTION; ARGON; CURRENT DENSITY; DESORPTION; ELECTRON CYCLOTRON RESONANCE; ELECTRONIC DENSITY OF STATES; FLUOROCARBONS; GLOW DISCHARGES; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING; RATE CONSTANTS;

HOT ELECTRON POPULATION;

PLASMA SOURCES;

EID: 0035328439     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.3419     Document Type: Article

References (15)