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Volumn , Issue , 2005, Pages 66-68
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First-principle molecular model of PECYD SiOCH film for the mechanical and dielectric property investigation
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS MATERIALS;
DIELECTRIC PROPERTIES;
ELASTIC MODULI;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYMERS;
SILICON COMPOUNDS;
ATOMIC COORDINATES;
FILM STRUCTURES;
MOLECULAR MODELS;
THIN FILMS;
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EID: 28244478416
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (6)
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References (14)
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