Mechanism of field emission from a highly phosphorous-doped chemical vapor deposition diamond (111) surface

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 1-3, 2007, Pages

  Kono, Shozo ^a,b   Takyo, Go ^a   Amano, Naoki ^a   Plusnin, Nickolay I ^a,d   Mizuochi, Kenji ^a   Aoyama, Tomohiro ^a,e   Goto, Tadahiko ^a   Abukawa, Tadashi ^a   Namba, Akihiko ^c   Tasumi, Natsuo ^c   Nishibayashi, Yoshiki ^c   Imai, Takahiro ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^d INSTITUTE OF AUTOMATION AND CONTROL PROCESSES   (Russian Federation)

^e JFE STEEL CORPORATION   (Japan)

Author keywords

Electron micro spectroscopy; Field emission electron microscopy; Field emission mechanism; Phosphorous doped diamond; Photoemission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; FERMI LEVEL; PHOTOEMISSION; WORK FUNCTION;

ELECTRON MICROSPECTROSCOPY; FIELD EMISSION ELECTRON MICROSCOPY; PHOSPHOROUS-DOPED DIAMOND; PHOTOEMISSION ELECTRON MICROSCOPY;

FIELD EMISSION;

EID: 34547867751     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L21     Document Type: Article

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