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Volumn 493, Issue 1-3, 2001, Pages 610-618

Secondary-electron and field-emission spectroscopy/microscopy studies of chemical vapor deposition grown diamond particles

(7) Kono, S a Goto, T a Sato, K a Abukawa, T a Kitabatake, M b,c Watanabe, A c Deguchi, M b

a TOHOKU UNIVERSITY (Japan)

b PANASONIC CORPORATION (Japan)

c OSAKA UNIVERSITY (Japan)

Author keywords

Chemical vapor deposition; Diamond; Field emission; Field emission microscopy; Secondary electron emission; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELD EFFECTS; EMISSION SPECTROSCOPY; FERMI LEVEL; FIELD EMISSION MICROSCOPES; FILM GROWTH; KINETIC ENERGY; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

DIAMOND PARTICLES (DP);

DIAMOND FILMS;

EID: 0035500571 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01273-0 Document Type: Conference Paper

Times cited : (9)

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