Interconnect and contact for nanoelectronics: Metallic TaSi2 nanowires

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8109-8112

  Chou, Li Jen ^a   Chueh, Yu Lun ^a   Ko, Mong Tzong ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Interconnect; Nanodot; Nanowire; TaSi2

Indexed keywords

ANNEALING; IRON COMPOUNDS; NANOELECTRONICS; SILICON; SYNTHESIS (CHEMICAL); TANTALUM COMPOUNDS; THIN FILMS;

INTERCONNECTS; NANODOTS;

NANOWIRES;

EID: 34547779408     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.021     Document Type: Article

References (17)

1. Dean K.A., and Chalamala B.R. Appl. Phys. Lett. 75 (1999) 3017
2. Zhu W., Kochanski G.P., Jin S., Seibles L., Jacobson D., McCormack C.M., and White A.E. Appl. Phys. Lett. 67 (1995) 1157
3. Chen L.J. JOM 57 (2005) 24
4. Kiyota H., Araki H., Kobayashi H., Shiga T., Kitaguchi K., Lida M., Wang H., Miyo T., Takida T., Kurosu T., Lnoue K., Saito I., Nishitan-Gamo M., Sakaguchi I., and Ando T. Appl. Phys. Lett. 75 (1999) 2331
5. Decker C.A., Solanki R., Freeouf J.L., Carruthers J.R., and Evans D.R. Appl. Phys. Lett. 84 (2004) 1389
6. Lee K.S., Mo Y.H., Nahm K.S., Shim H.W., Suh E.K., Kim J.R., and Kim J.J. Chem. Phys. Lett. 384 (2004) 215
7. Xiang Q., Wang Q.X., Wang Z., Zhang X.Z., Liu L.Q., Xu J., and Yu D.P. Appl. Phys. Lett. 86 (2005) 243103
8. Leapamn R.D., Grunes L.A., and Fejes P.L. Phys. Rev., B 26 (1982) 26
9. Bonard J.M., Maier F., Stockli T., de Heer W.A., Salvetat J.P., and Forro L. Ultramicroscopy 73 (1998) 918
10. Liu C., Tong Y., Cheng H.M., Golberg D., and Bando Y. Appl. Phys. Lett. 86 (2005) 223114
11. Chueh Y.L., Chou L.J., Cheng S.L., He J.H., We W.W., and Chen L.J. Appl. Phys. Lett. 86 (2005) 133112
12. Zhou J., Gong L., Deng S.Z., Chen J., She J.C., Xu N.S., Yang R., and Wang Z.L. Appl. Phys. Lett. 87 (2005) 223108
13. Hsiou Y.F., Yang Y.J., Stobinski L., Kuo W., and Chen C.D. Appl. Phys. Lett. 84 (2003) 984
14. Nava F., Tu K.N., Mazzega E., Michelini M., and Queirolo G. J. Appl. Phys. 61 (1987) 1085
15. Maex K., and Rossum M.V. Properties of Metal Silicides (1995), INSPEC, London, UK
16. Nava F., Bisi O., and Tu K.N. Phys. Rev., B 34 (1986) 6143
17. Cui Y.C., Duan X., Hu J., and Lieber C.M. J. Phys. Chem., B 104 (2000) 5213